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Re: Re: NEW PATEND

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Posted by M Arthur Auslander on November 22, 2002 at 00:18:53:

In Reply to: Re: NEW PATEND posted by Geoff Day 07984 203001 on November 21, 2002 at 23:07:37:

: : ihave a product i want to patend pend., where do you go within your state to have this done? p.s. i live in Va.

Dear Mr. Day,
Patents are national only. Just getting a patent can be a huge waste of time money and worry. It you have a valuable invention, it is important to keep it secret at least until the patent application has been filed.

There is a scam operation getting patents for inventors. They cost as much as a legitimate lawyer patent charges and they get patents. only one in ten thousand get back more than they pay.

There are even Patent Lawyers that do the same thing.

We start start with a Reality Check® to save time money and worry.

M. Arthur Auslander
Auslander & Thomas-Intellectual Property Law Since 1909
505 Eighth Avenue, New York, NY 10018
212-594-6900, fax 212-244-0028, aus@auslander.com
ELAINE's Workshop®
E arly L egal A dvice I s N ot E xpensive™
Reality Check®

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Subject: Re: Re: Re: NEW PATEND

Comments:
: : : ihave a product i want to patend pend., where do you go within your state to have this done? p.s. i live in Va. : Dear Mr. Day, : Patents are national only. Just getting a patent can be a huge waste of time money and worry. It you have a valuable invention, it is important to keep it secret at least until the patent application has been filed. : There is a scam operation getting patents for inventors. They cost as much as a legitimate lawyer patent charges and they get patents. only one in ten thousand get back more than they pay. : There are even Patent Lawyers that do the same thing. : We start start with a Reality Check® to save time money and worry. : M. Arthur Auslander : Auslander & Thomas-Intellectual Property Law Since 1909 : 505 Eighth Avenue, New York, NY 10018 : 212-594-6900, fax 212-244-0028, aus@auslander.com : ELAINE's Workshop® : E arly L egal A dvice I s N ot E xpensive™ : Reality Check®

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Re: Re: NEW PATEND

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